X-Ray Lithography - XRL Exposure Stations
The Institute for Microstructure Technology (IMT) operates the clean room facility which is equipped with three LIGA beamlines to perform X-ray lithography. Each beamline is dedicated to a specific task in the LIGA-process, which are high resolution X-ray mask making (LIGA1 / Litho1), deep X-ray lithography (LIGA2 / Litho2) and the full range of X-ray lithography possibilities including ultra deep X-ray lithography (LIGA3 / Litho3) with optimized exposure conditions, depending of the available spectrum, which is filtered by dedicated mirrors.
Beamline | Technical/ scientific application | Experimental station | Specification | Source |
---|---|---|---|---|
LIGA I | Mask fabrication, patterning of thin microstructures | Scanner | Energy range: 2.2 - 3.3 keV |
Dipole magnet |
LIGA II | Deep x-ray lithography | Scanner | Energy range: 2.5 - 12.4 keV |
Dipole magnet |
LIGA III | Full range of x-ray lithography possibilities | Scanner | Energy range: 2.2 - 20.0 keV |
Dipole magnet |